OIN 23737-2021 “Céramiques Fines (Céramiques avancées, céramiques techniques avancées) – Méthodes d'évaluation des caractéristiques d'usure et de frottement de films céramiques fins dans des conditions humides et sèches”

préface
OIN (Organisation internationale de normalisation) est la fédération mondiale des organismes nationaux de normalisation (Comités membres de l'ISO). L'élaboration de normes internationales est généralement réalisée par l'intermédiaire de comités techniques ISO.. Chaque groupe membre intéressé par un sujet pour lequel un comité technique a été créé a le droit d'être représenté au sein du comité.. International, les organisations gouvernementales et non gouvernementales en liaison avec l'ISO sont également impliquées dans ces travaux. L'ISO travaille en étroite collaboration avec la Commission électrotechnique internationale (CEI) sur toutes les questions de normalisation électrique.

Partie 1 de la Directive ISO/CEI décrit les procédures utilisées pour élaborer ce document et pour sa maintenance ultérieure.. En particulier, prendre note des différentes normes d'approbation requises pour les différents types de documents ISO. This document has been drafted in accordance with the editorial rules in Part 2 de la directive ISO/CEI (voir iso.org/directives).

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Explications des normes pertinentes de volontariat, Termes spécifiques ISO liés à l'évaluation de la conformité et à l'expression de la signification, et l'ISO dans les barrières techniques au commerce (OTC) adhérer au principe de l'organisation mondiale du commerce (OMC) information, please refer to the iso.org/iso/foreword.html.

This document has been prepared by ISO/TC 206 Technical Committee on Fine Ceramics.

Any feedback or questions on this document should be referred to the user’s national standards body. A complete list of these institutions can be found at iso.org/members.html.

OIN 23737-2021 “Céramiques Fines (Céramiques avancées, céramiques techniques avancées) – Méthodes d'évaluation des caractéristiques d'usure et de frottement de films céramiques fins dans des conditions humides et sèches”

introduire
Fine ceramic films are used in a variety of applications, such as sensors, actuators or other micromechanical components; Display element; Memory element; Recording media; Optical element; Packaging film; And films and glass for buildings and vehicles. In the industrial application of fine ceramic films, wear resistance is an important index for evaluation. The wear resistance of fine ceramic films is greatly affected by the ambient humidity and the humidity history of the films. Fine ceramic films are also used in different humidity environments where criteria are required to evaluate wear resistance and friction coefficient over a wide humidity range. The standards published to date for wear resistance testing only assume a temperature environment of 23 °C and a relative humidity of 50 %. The thickness of the film to be measured is also relatively large, with a few to 10μm. These test procedures are not suitable for evaluating the wear resistance of fine ceramic films with thickness up to approximately 1 µm for use in electronic and optical devices because the wear resistance of small indentation loads is affected by the relative humidity of the test environment, c'est à dire. the mechanism used in the wear testing of fine ceramic films with small indentation loads is strongly affected by the relative humidity of the test environment. Donc, the wear test of fine ceramic film should be carried out under the specified relative humidity conditions. This document provides measurements that help accurately assess the wear resistance of fine ceramic films, up to a thickness of approximately 1 µm, deposited on thin substrates or organic polymer films, in dry and high humidity environments. The present document has been developed to facilitate industrial development through the rapid dissemination of these measurements.

1 Champ d'application
This document specifies a method for testing the wear resistance and friction coefficient of fine ceramic films in dry and high humidity environments, where such films may be up to approximately 1 µm thick and deposited on a substrate or base, including thin or very thin organic polymer film substrates.

2 Dossiers normatifs de référence
When the following documents are referenced in the context, part or all of them constitute the requirements of this document. Pour les références datées, les versions avec citation uniquement s'appliquent. Pour les citations non datées, the most recent version of the referenced document (y compris les éventuelles modifications) s'applique.

OIN 3274, Geometric Product Specification (GPS) – Surface texture: section methodNominal characteristics of contact (stylus) instruments

OIN 13565-1, Geometric Product Specification (GPS) – Surface Texture: Section method Surfaces with layered functional properties – Partie 1: filtration and general measurement conditions

OIN 13565-2, Geometric Product Specification (GPS) – Surface Texture: Section method Surfaces with layered functional properties – Partie 2: Characterization of heights using linear material ratio curves

OIN 20507, Céramiques Fines (Céramiques avancées, céramiques techniques avancées) — Vocabulaire

3 Termes et définitions
Aux fins de ce document, les termes et définitions donnés dans l'ISO 20507 and below apply.

3.2 Friction force

The resistance exerted on a relative body when objects in contact move or tend to slide against each other

3.3 Friction coefficient

The dimensionless ratio of friction to the applied normal force

3.4 Wear test

Tests for the evaluation of friction and wear characteristics caused by sliding contact motion

Note 1: In a narrow sense, the termwear testrefers to the process by which wear occurs on the specimen as a result of sliding motion; In broad terms, it means processes such as sample preparation, wear formation, friction coefficient measurement, and evaluation of wear trajectoryand wear parts formed on the inverse material.

3.5 Drying Chamber

A sealed container for removing moisture from the surface of the sample while the sample is kept in a vacuum

3.6 Humidité relative

Ratio of partial vapor pressure to saturated vapor pressure at a given temperature

3.7 Dry air

Air with a dew point of −60 °C or lower at an absolute pressure of 101.3 kPa

3.8 Dry Nitrogen

At an absolute pressure of 101.3 kPa, the dew point is −60 °C or lower nitrogen

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