LR-161CS LR-1614C X ray fluorescence Spectrometer
- 説明
- 問い合わせ
説明
分光計
1.製品導入:
The new generation of design, is a unique sense of science and technology of one-machine multi-purpose spectrometer, using advanced EFP algorithm and low-light clustering technology with a new generation of multi-channel timely sequencing, specialized type not only retains the performance of the special thickness gauge to detect small samples and grooves, but also can meet the micro-area RoHS detection and full element analysis. Every function is the most professional.
2.Performance advantage
Micro sample detection Minimum measuring area 0.03mm² Zoom device algorithm The measuring distance can be changed to measure concave and convex shaped samples, and the zoom distance can reach 0-30mm Advanced EFP algorithm Li(3)-U(92) element coating, multiple layers of multiple elements, even the same element in different layers can be accurately measured Advanced spectrum resolution technology Reduce the interference of similar energy elements and reduce the detection limit High performance detector High performance SDD silicon drift detector with measurement accuracy up to nanometer level X-ray apparatus Microfocus enhanced ray tube with focusing device One machine multi-purpose, fine test fine test At the same time to meet the coating, RoHS, and alloy composition detection, and is the fine test, each use is professional grade
entry モデル番号 | LR-161CS | LR-1614C |
Coating analysis | It can analyze 23 コーティングと 24 kinds of elements at the same time, and it can also analyze and detect 90 kinds of elements of Li(3)-U(92) coating with the same elements in different layers | |
RoHS analysis | The minimum detection limit of harmful elements (RoHS, halogens) is 2ppm | The minimum detection limit of harmful elements (RoHS, halogens) is 1ppm |
Component Analysis | S(16)-U(92) | アル(13)-U(92) |
EFP algorithm | 標準 | |
Software operation | humanized closed software, automatically judge fault prompt correction and operation steps to avoid misoperation | |
分析時間 | 3-200 秒 | 1-200 秒 |
検出器 | Si-Pin semiconductor detector | SDD Silicon drift detector |
X-ray device | Microfocus enhanced ray tube | |
collimator | 標準: □0.1*0.3mm; Phi is 0.3 んん; Phi is 1.2 んん; φ3mm four collimator automatic switching (Optional φ0.2mm; Phi is 0.5 んん; Phi is 1.2 んん; Phi is 3 んん)
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Low light concentration technology | recently measured the spot diffusion is less than 10% | |
フィルター | Four kinds of filter freely switch | |
Measuring distance | With distance compensation function, can change the measuring distance of concave and convex shaped samples, zoom distance 0-30mm | |
Sample observation | 1/2.7 “カラーCCD, zoom function | |
Focusing mode | Highly sensitive lens, manual focus | |
magnification | Optical 38-46X, デジタル増幅 40-200 回 | |
楽器のサイズ | 545mm*380mm*435mm | |
Sample chamber height | 210んん | |
Sample table moving mode | High precision XY manual slide rail | |
Movable range | 50ミリメートル*50ミリメートル | |
weight of the instrument | 50kg | |
Other accessories | A set of computer, プリンター, アクセサリーボックス, 12-element sheet, RoHS standard sheet, electroplating solution measurement Measuring cup (オプション), standard plate (2 out of 10) | |
X-ray standards | DIN ISO3497, から 50987 and ASTMB568 |