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描述
产品参数
产品名称 | 真空等离子清洗机 |
产品型号 | GD-10 |
电源 | 交流220V(±10V) |
电源 | 100w-300w |
Cavity size (毫米) | 560X550X400mm(WXDXH) |
工作频率 | 40 KHZ and 13.56 兆赫兹 (选项) |
气源压力 | 2-2.5 公斤 |
重量 | 100公斤 |
使用燃气 | Nitrogen, 氧, 氮, 空气 |
连接长度 | 2m-4m |
Small vacuum plasma cleaner,Etcher for electronic products,Vacuum plasma surface treatment machine
功能特点
Product surface modification
The modification of Fangrui plasma equipment can effectively reduce the influence factors of material pretreatment by 95%
Product surface activation
The surface activation rate of the materials pretreated with Fangrui plasma equipment is 98%
Product surface cleaning
The modification of Fangrui plasma equipment can effectively reduce the influence factors of material pretreatment by 95%
Product surface bonding
The adhesion of the material surface was improved by 92% by using Fangrui plasma equipment
Application of multiple industries
适合于 95% industry, strong compatibility
汽车制造业
手机制造业
纺织印染行业
半导体封装行业
Heavy industry
新能源产业
FBC/PCB领域
医疗行业
Small vacuum plasma cleaner,Etcher for electronic products,Vacuum plasma surface treatment machine
第一的, the advantages of vacuum equiseparation cleaning machine
Compared with traditional processes, plasma surface treatment technology has the following advantages:
[Strong function] : Modification only occurs on the surface of the material (about a few to dozens of nanometers), without changing the inherent properties of the matrix
To give one or more new functions;
[Wide application] : regardless of the substrate type of the treatment object, such as metal, 塑料, 玻璃, 高分子材料, ETC。, can be processed;
[易于操作] : simple process, 易于操作, strong production control and high stability;
[High efficiency] : short treatment time, high reaction rate, good treatment uniformity;
[Energy saving, 环境保护] : The whole process of dry treatment, no consumption of water resources, no need to add chemical agents, no pollution.
二, 产品介绍
RD-10 Vacuum plasma cleaning machine is a vacuum reaction chamber can rotate 360° cleaning machine, widely used in small batch production of enterprises or universities for scientific research. The whole machine is compact, 性能稳定, uniform and stable treatment effect, 高性价比, vacuum reaction chamber can rotate 360°, 360° without dead Angle processing granular products and small irregular products.
1. Equipment composition
Plasma cleaning machine is composed of reaction chamber (also known as vacuum chamber), 真空系统, discharge system, electric control system, intake flow control system.
The reaction chamber consists of a vacuum chamber and an electrode, which is a plasma reaction space. The items to be treated are placed in the reaction chamber. The vacuum system consists of a vacuum gauge, a vacuum pump and a vacuum pipe, which is responsible for purifying the air in the reaction chamber and maintaining an appropriate vacuum degree during operation. The discharge system provides signal and energy for the reaction chamber to stimulate the ionization of the reaction gas in the chamber to form the plasma needed. The function of the electronic control system is to control the operation process of the equipment according to the optimal process parameters and steps, and maintain the stability of the process parameters; The intake flow control system is mainly composed of mass flowmeters and electromagnetic valves. Its function is to accurately control the intake flow of the reaction gas and maintain the vacuum required during the working period.
The device uses a touch screen +PLC programmable controller, processing parameters can be arbitrarily set on the touch screen, with manual/automatic switching function. The automatic operation adopts “one key type”, and the working process is completely controlled by the computer automatically. Manual operation is performed by the user on the manual mode interface.
Small vacuum plasma cleaner,Etcher for electronic products,Vacuum plasma surface treatment machine
数字 | Item type | Specific parameter |
1 | Plasma generator | Intermediate frequency 40Khz Intermediate frequency power 100~300W |
2 | Plasma reaction control software | Fang Rui technology independently developed proprietary software V1.0 Fully automatic system control |
3 | 真空室 | Cavity internal size: Φ210*300mm Chamber material: 304 stainless steel material |
4 | Vacuum reaction chamber | Cavity internal size: Φ160*230mm Chamber material: 304 stainless steel material |
5 | electrode | Design of cylindrical electrode structure. Reaction volume: 5L |
6 | 真空泵 | Bipolar direct rotary vane vacuum pump pumping rate: 14.4m3/H Limit vacuum: 6*10-2Pa Power: 0.55千瓦 |
7 | Pipes and components | Vacuum pipe: 304 stainless steel vacuum corrugated pipe Working gas pipeline components: PVC transparent hose +304 stainless steel connectors to ensure efficient operation and reliability of the equipment. |
8 | 真空计 | Japanese Panasonic digital display table |
9 | Gas control | 2 way process gas, solenoid valve control, mechanical manual adjustment 0.1 ~ 1NL/min |
10 | Plasma process gas | Support two process gas: 氩气, 氧 (氩气, 氧, 氮, 氢, carbon tetrafluoride optional) |
11 | 控制方式 | 4.3 “industrial control touch screen, real-time display of working status |
12 | Vacuuming time | 30s pressure <50帕 |
13 | Vacuum breaking system | Solenoid valve + silencer Vacuum breaking time: 30s |
14 | Single processing time | 1-30 分钟 (depending on product characteristics, power and time Settings are different) |
15 | Electrode material | Custom 304 stainless steel electrodes |
16 | 其他参数 | 电源: 交流220V(±10V) 机器尺寸: W700×D640×H475mm (for reference) 机器重量: 55公斤 Machine: 高的 – quality anti – rust paint |
17 | Motor speed range | <10 turns /min |