Machine de nettoyage plasma sous vide SPV-150
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Description
Machine de nettoyage plasma sous vide SPV-150
Outline:
Vacuum Plasma Cleaner(Nettoyant plasma),the gas is separated into plasma state through the excitation power supply, and the plasma ACTS on the product surface to clean the pollutants on the product surface, so as to improve the surface activity and enhance the adhesion.Plasma cleaning is a new, protection environnementale, efficient and stable surface treatment.
Machine de nettoyage plasma sous vide SPV-150
P.roduct feature:
1.Product placement fixture flexible, can adapt to irregular products
2.Horizontal electrode design can meet the requirements of soft product processing.
3.Low energy and gas consumption products.
4.Convenient way to put up and down the board
5.Vacuum system integration, petite empreinte
6.Reasonable plasma reaction space, so that the treatment is more uniform
7.Integrated control system design makes operation more convenient
jendustry application:
1.Mobile phone industry: TP, middle frame, back cover surface cleaning activation
2.PCB/FPC industry: hole drilling and surface cleaning, Coverlay surface coarsening and cleaning
3.Industrie des semi-conducteurs: semiconductor packaging, module caméra, LED packaging, BGA packaging, 4.Wire Bond pretreatment
5.Ceramics: emballage, pre-treatment of glue
6.Surface roughening etching: PI surface roughening, PPS etching, semiconductor silicon chip PN junction removal, ITO film etching
7.Plastic materials: Teflon surface activation, ABS surface activation, and other plastic material cleaning activation
8.Clean the surface before applying ITO
Machine de nettoyage plasma sous vide SPV-150
Specification of equipment:
Power system | radio-frequency power supply | medium-frequency power supply | |
pouvoir | 0~600W | 0~1000W or 0-2000W | |
fréquence | 13.56MHz | 40KHz | |
Vacuum plant | Double-stage vane pump (oil pump) | Double stage rotary vane pump (oil pump) or Roots pump + single stage rotary vane pump | |
vacuum line | All stainless steel piping and high strength vacuum bellows | ||
texture | Aluminum alloy (customizable stainless steel cavity) | ||
épaisseur | 25mm | ||
leakproofness | Military grade welding seal | ||
Cavity internal dimensions | 500×500×670mm (width × height × depth) | ||
Effective size of electrode plate | 587×470mm(width × depth) | ||
Available space spacing | 34mm | ||
Electrode layout | Horizontal arrangement, activity extraction
| ||
Work tray | Standard one set, material optional (aluminium, steel wire mesh) | ||
work space | 8 couche | ||
Gas system | flow range | 0~300SCCM | |
Process gas path | Standard with two, Peut être personnalisé | ||
Système de contrôle | systems control | API | |
delivery method | 7 écran tactile en pouces | ||
Other parameters | dimension de limite | 1020×1720×1120mm(w×h×d) | |
poids | 350KG | ||
Equipment appearance color | silver gray |
Spécifications d'usine:
Spécifications d'usine | |
Spécification de l'alimentation CA
| Source de courant:AC380V,50/60Hz,5fil,50UN |
Échappement d'usine
| Couler:2.0 m³/min |
Gas requirements for plant work
| Couler:1~10 L/min Pression:3~7kg/cm² Diamètre du tuyau:8×5mm Texture:Tuyau en PU Purity:Plus que 99.99% |
Factory compressed air requirements
| Couler:1~10 L/min Pression:3~7kg/cm² Diamètre du tuyau:8×5mm Texture:PUpipe point de rosée:-40℃ under Particule> 0,3 μm:10Pièces/pi³ |
2.3 gen général R.exigences
Exigences générales | |
Identification des risques | Identification des risques liés à la haute pression
|
Environnement de services | température:15~30℃ humidité:30~70% |
Autres questions nécessitant une attention particulière | Gaz incombustibles, gaz corrosifs, explosions ou poussières réactives Gas cylinders need to be fixed |
Liste de configuration | |||||
Serial Number | Nom | description | unité | quantité | |
1 | Moteur principal | dimension de limite:1020×1720×1120mm (width × height × depth) | Pc | 1 | |
2 | Love sincerely | Aluminum alloy vacuum chamber inside dimension 500×500×675mm (width × height × depth) | Pc | 1 | |
3 | Excitation power supply | radio-frequency power supply | edium-frequency power supply | Ensemble | 1 |
fréquence:13.56MHz; Pouvoir 0 ~ 600 w Or 0~1000W is optional; Fully automatic vacuum capacitor matching unit | fréquence:40KHz; 0~1000W or 0-2000w
| ||||
4 | API | Siemens,S7-200 | Pc | 1 | |
5 | Touch screen | Wei lun tong,7 inch screen,MT6071iE | Pc | 1 | |
6 | Débitmètre | British wawick brand | Pc | 2 | |
7 | Pompe à vide | Flyover double-stage vane pump (oil pump):60m3/h | Pc | 1 | |
8 | Vacuum gauge | The fu kang | Pc | 1 | |
9 | spécification | Vacuum plasma cleaning machine spv-150 operation manual | Pc | 1 |