Machine de nettoyage plasma sous vide SPV-60
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Description
Machine de nettoyage plasma sous vide SPV-60
Outline:
Vacuum Plasma Cleaner(Nettoyant plasma),the gas is separated into plasma state through the excitation power supply, and the plasma ACTS on the product surface to clean the pollutants on the product surface, so as to improve the surface activity and enhance the adhesion.Plasma cleaning is a new, protection environnementale, efficient and stable surface treatment.
Machine de nettoyage plasma sous vide SPV-60
P.roduct feature:
1.Product placement fixture flexible, can adapt to irregular products
2.Horizontal electrode design can meet the requirements of soft product processing.
3.Low energy and gas consumption products.
4.Convenient way to put up and down the board
5.Vacuum system integration, petite empreinte
6.Reasonable plasma reaction space, so that the treatment is more uniform
7.Integrated control system design makes operation more convenient
Machine de nettoyage plasma sous vide SPV-60
jendustry application:
1.Mobile phone industry: TP, middle frame, back cover surface cleaning activation
2.PCB/FPC industry: hole drilling and surface cleaning, Coverlay surface coarsening and cleaning
3.Industrie des semi-conducteurs: semiconductor packaging, module caméra, LED packaging, BGA packaging, 4.Wire Bond pretreatment
5.Ceramics: emballage, pre-treatment of glue
6.Surface roughening etching: PI surface roughening, PPS etching, semiconductor silicon chip PN junction removal, ITO film etching
7.Plastic materials: Teflon surface activation, ABS surface activation, and other plastic material cleaning activation
8.Clean the surface before applying ITO
Machine de nettoyage plasma sous vide SPV-60
Technical specifications
Power System
| Radio-frequency power supply | Medium-frequency power supply | |
Pouvoir | 0~600W | 0~1000W | |
Fréquence | 13.56MHz | 40KHz | |
Système de vide
| Two-stage rotary vane pump (oil pump) | 40m3/h | |
Vacuum line | All stainless steel piping, and high strength vacuum bellows | ||
Matériel | Aluminum alloy (customizable stainless steel chamber) | ||
Épaisseur | 25mm | ||
Leakproofness | Military grade welding seal | ||
Internal dimension of cavity | 375×375×430mm(W×H×D) | ||
Effective size of electrode plate | 345×344mm(W×D) | ||
Available space spacing | 22.5mm | ||
Electrode plate layout | Horizontal layout, movable extraction | ||
Work tray | Standard set, material optional (aluminium, wire mesh) | ||
Work space | 6 layers | ||
Gas system
| Plage de débit | 0~300SCCM | |
Process gas gas circuit | Standard with two channels, Peut être personnalisé | ||
Système de contrôle | System control | API | |
Delivery method | 7 écran tactile en pouces | ||
Other Parameter
| Dimension limite | 900×1600×900mm(宽×高×深) | |
Poids | 150KG | ||
Device appearance color | silver gray |
Factory specification requirements
Factory specification requirements | |
Ac power specifications | Source de courant:AC380V,50/60Hz,5 lignes,50UN |
Échappement d'usine | Couler:2.0 m³/min |
Gas requirements for factory work | Couler:1~10 L/min Pression:3~7kg/cm² Diamètre du tuyau:6×4 mm Matériel: Tuyau en PU Purity: au-dessus de 99.99% |
Factory compressed air requirements | Couler:1~10 L/min Pression:3~7kg/cm² Diamètre du tuyau:8×5mm Matériel: Tuyau en PU point de rosée: en dessous de -40 ℃ Particule> 0,3 μm:10Pièces/pi³ |
Configuration list
configuration list | |||||
Non | Nom | Description | Unité | Quantité | |
1 | Hôte | Dimension limite:900×1600×900mm(W×H×D) | Pc | 1 | |
2 | Vacuum chamber | Aluminum alloy vacuum chamber Inside dimension375×375×430mm(W×H×D) | Pc | 1 | |
3 | Excitation power supply | Radio-frequency power supply | Medium-frequency power supply | Ensemble | 1 |
Fréquence:13.56MHz; Pouvoir :0~600W Automatic vacuum capacitor matcher | Fréquence:40KHz; 0~1000W;
| ||||
4 | API | SIEMENS,S7-200 | Pc | 1 | |
5 | Touch screen | Vellon, 7 inch screen, MT6071iE | Pc | 1 | |
6 | Débitmètre | British Wawick brand | Pc | 2 | |
7 | Pompe à vide | Flyover two-stage rotary vane pump (oil pump) : 40m3/h | Pc | 1 | |
8 | Vacuum gauge | INFICON
| Pc | 1 | |
9 | Manuel
| Operation manual of vacuum plasma cleaner SPV-60 | Pc | 1 |
Optional table
Optional table | ||
Excitation power supply | Radio-frequency power supply | Medium-frequency power supply |
Custom power: fréquence:13.56MHz; Pouvoir:0~1000W; Custom automatic vacuum capacitor matching machine | Fréquence:40KHz,pouvoir:2000W
| |
CERES power supply: frequency 13.56MHz; Pouvoir:0~600W or 0~1000W Optional ; American CERES automatic vacuum capacitor matcher | ||
Pompe à vide | Germany Leibao double-stage rotary vane pump (oil pump):40m3/h | |
Flyover two-stage rotary vane pump (oil pump) :40m3/h |